Neodymium Sputtering Target (Nd)

Neodymium Sputtering Target (Nd)
Material Type:
Formula:
Mol:


Boiling Point (°C):
Density:
Atomic number :
Neodymium Sputtering Target (Nd)
Nd
1021°C


3074°C
7.01g/cm³
30
Description

Material Type

Neodymium

Symbol

Nd

Atomic Weight

144.242

Atomic Number

60

Color/Appearance

Silvery White, Yellowish Tinge, Metallic

Thermal Conductivity

17 W/m.K

Melting Point (°C)

1021°C

Coefficient of Thermal Expansion

9.6 x 10-6/K

Theoretical Density (g/cc)

7.01

Rare earth neodymium targets are made from the rare earth element neodymium and are primarily used in thin film deposition processes for various industrial and technological applications. Neodymium possesses unique physical and chemical properties, making it widely applicable across multiple fields. Here are the main uses of rare earth neodymium targets:

Manufacture of Magnetic Materials: Neodymium is a key component in the production of neodymium-iron-boron (NdFeB) magnets, which are among the strongest permanent magnet materials on the market. Although neodymium targets are primarily used for thin film deposition, they may also find applications in the preparation and development of magnetic thin films with neodymium content.

Optoelectronic Devices:The optical properties of neodymium make it crucial in laser technology, especially in the manufacturing of certain types of lasers such as neodymium-doped solid-state lasers (e.g., Nd:YAG lasers). Neodymium targets can be used for depositing coatings, which are essential components in optoelectronic devices.

High-Performance Coatings: Neodymium targets can be utilized for depositing thin films with specific electrical and magnetic properties, which can be applied in various high-tech devices and sensors.

Scientific Research: In materials science and surface science research, neodymium targets can be used to explore advance material properties and develop advanced coating technologies.

LXAM produces neodymium with a regular purity of REM99.9% and distilled neodymium with a purity of REM99.99%.. The average grain size is <200um.

Manufacture Method: Hot Pressing (HP), Hot/Cold Isostatic Pressing (HIP, CIP), Vacuum Melting, Vacuum Sintering.


Features:

High purity, high density (Close to 100%), low gas content

Grain refinement

Semiconductor grade

High utilization efficiency


Production Process:

Raw Material Preparation - Melting - Forging - Rolling - Heat Treatment - Machining - Quality Inspection - Packaging - Shipping


Customized Size

Circular: Diameter <= 14 inch, Thickness >= 1mm;

Rectangle: Length <= 48 inch, Width <= 15.75 inch, Thickness >= 1mm.

For larger product sizes, we can do 45-degree or 90-degree angle tiles.

If you have other requirements, we can customize for you. Please provide drawings (PDF, JPG, PNG).

LXAM offers high-quality products at competitive prices and welcomes inquiries, promising a response within 24 hours.

 

 


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