Gadolinium Sputtering Target (Gd)

Gadolinium Sputtering Target (Gd)
Material Type:
Formula:
Mol:


Boiling Point (°C):
Density:
Atomic number :
Gadolinium Sputtering Target (Gd)
Gd
1312C°


3273C°
7.895g/cm³
64
Description

Material Type

Gadolinium

Symbol

Gd

Atomic Weight

157.25

Atomic Number

64

Color/Appearance

Silvery White, Metallic

Thermal Conductivity

11 W/m.K

Melting Point (°C)

1312

Coefficient of Thermal Expansion

9.4 x 10-6/K

Theoretical Density (g/cc)

7.9g/cm³

Rare earth gadolinium sputtering targets are made from the rare earth element gadolinium (Gd) and are typically used in thin film deposition processes such as physical vapor deposition (PVD) and chemical vapor deposition (CVD). These targets have wide-ranging applications in various fields, primarily including the following aspects:

Medical Imaging: Rare earth gadolinium targets are commonly used as contrast agents in magnetic resonance imaging (MRI) to enhance image contrast and clarity. Due to the unique magnetic properties of gadolinium, it can enhance the contrast effect of magnetic resonance images, assisting doctors in more accurately diagnosing diseases.

Nuclear Energy: Gadolinium elements also find applications in the nuclear energy industry, such as being used as control rod materials in nuclear reactors to regulate the rate and intensity of nuclear reactions, ensuring the stability and safety of the nuclear reaction process.

Magnetic Materials: Rare earth gadolinium targets can be used to prepare magnetic materials such as magnetic recording materials and magnetic storage devices. Gadolinium elements exhibit strong magnetism and excellent magnetic stability, making them suitable for the production of high-performance magnetic materials.

Other Applications: In addition to the aforementioned primary application areas, rare earth gadolinium targets may also be applied in other fields such as nanotechnology, catalysis, and electronic devices.

LXAM produces Gadolinium with a regular purity of REM99.9% and distilled Gadolinium with a purity of REM99.99%.. The average grain size is <200um.

Manufacture Method: Hot Pressing (HP), Hot/Cold Isostatic Pressing (HIP, CIP), Vacuum Melting, Vacuum Sintering


Features:

High purity, high density (Close to 100%), low gas content

Grain refinement

Semiconductor grade

High utilization efficiency


Production Process:

Raw Material Preparation - Melting - Forging - Rolling - Heat Treatment - Machining - Quality Inspection - Packaging - Shipping


Customized Size

Circular: Diameter <= 14 inch, Thickness >= 1mm;

Rectangle: Length <= 48 inch, Width <= 15.75 inch, Thickness >= 1mm.

For larger product sizes, we can do 45-degree or 90-degree angle tiles.

If you have other requirements, we can customize for you. Please provide drawings (PDF, JPG, PNG).

LXAM offers high-quality products at competitive prices and welcomes inquiries, promising a response within 24 hours.

 


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